
NILmaterials focusses on the development of a new generation of nanoimprint materials. These materials belong to the class of inorganic-organic hybridmaterials based on functionalized silsesquioxanes (SSQ). Novel functionalized SSQ materials will be synthesized, formulated to UV-curing imprint materials and their performance will be shown within the use of ionic stamps for µ/n-contact printing, as well as working stamp material with inherent anti-adhesive properties.